講者首先介紹艾司摩爾公司在半導體供應鏈的地位，為設備供應與製造商，提供例如台積電、三星等大廠設備使用，同時因為彼此在產業鏈上扮演舉足輕重的地位，使得艾司摩爾的進步極為重要，能帶動其他半導體業的改變，牽一髮而動全身。接著介紹關於艾司摩爾的關鍵步驟—曝光，而整體過程的微影技術也是讓晶片微縮的關鍵，將決定晶片價值，是否能製作出更低奈米製程的晶片以跟上摩爾定律。也介紹了艾司摩爾的EUV（極紫外光曝光機），利用電子躍遷的概念並採用CO2雷射電漿技術來產生波長為13.5奈米的極紫外光，目前此技術也獨步領先全球。最後介紹了艾司摩爾的公司文化與理念，因為有來自各個國家的員工，所以有更多文化交流和學習的空間，同時大家秉持著公司的3C原則(Challenge、Collaboration、Care)，讓個人與團體不斷精進，伴隨公司一起成長。
撰寫者：大學部學生 陳冠霖
The speaker first introduced the position of ASML in the semiconductor supply chain, as a provider of equipment for manufacturers such as TSMC and Samsung. Due to the crucial role they play in the industry chain, the progress of ASML is extremely important and can drive changes in other semiconductor industries. They then introduced the key step in ASML's process - exposure. The overall process of photolithography is also crucial for shrinking the size of chips and determining their value, as well as whether they can produce chips with lower nanometer processes to keep up with Moore's Law. The speaker also introduced ASML's EUV (extreme ultraviolet) exposure machine, which uses the concept of electronic transitions and adopts CO2 laser plasma technology to generate extreme ultraviolet light with a wavelength of 13.5 nanometers, a technology that is currently leading the world. Finally, the speaker introduced ASML's company culture and philosophy, which embraces cultural exchange and learning opportunities due to the diverse backgrounds of employees from different countries. The company's 3C principles (Challenge, Collaboration, and Care) encourage individuals and teams to constantly improve and grow alongside the company.
Author: Bachelor student, Guan-Lin Chen.